High‐performance vacuum‐processed metal oxide thin‐film transistors: A review of recent developments
DC Field | Value | Language |
---|---|---|
dc.contributor.author | HEEJUN KIM | - |
dc.contributor.author | 박경호 | - |
dc.contributor.author | HYUN JAE KIM | - |
dc.date.accessioned | 2023-04-10T01:40:15Z | - |
dc.date.available | 2023-04-10T01:40:15Z | - |
dc.date.issued | 2020-07 | - |
dc.identifier.issn | 1071-0922 | - |
dc.identifier.uri | https://yscholarhub.yonsei.ac.kr/handle/2021.sw.yonsei/6369 | - |
dc.format.extent | 32 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | WILEY-BLACKWELL | - |
dc.title | High‐performance vacuum‐processed metal oxide thin‐film transistors: A review of recent developments | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1002/jsid.886 | - |
dc.identifier.scopusid | 2-s2.0-85084225010 | - |
dc.identifier.wosid | 000528763600001 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, v.28, no.7, pp 591 - 622 | - |
dc.citation.title | JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY | - |
dc.citation.volume | 28 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 591 | - |
dc.citation.endPage | 622 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | A-IGZO TFT | - |
dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
dc.subject.keywordPlus | OXYGEN PARTIAL-PRESSURE | - |
dc.subject.keywordPlus | LOW-FREQUENCY NOISE | - |
dc.subject.keywordPlus | P-TYPE SNO | - |
dc.subject.keywordPlus | SEMICONDUCTOR-BASED CIRCUITS | - |
dc.subject.keywordPlus | BIAS STRESS STABILITY | - |
dc.subject.keywordPlus | N-CHANNEL ZNO | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | GATE-BIAS | - |
dc.subject.keywordAuthor | oxide thin-film transistors | - |
dc.subject.keywordAuthor | Vacuum process | - |
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