상세 보기
Ultra Low-k Properties of Atomic Layer Deposited Amorphous Boron Nitride for Futuristic Inter Metal Dielectric
- 손인규;
- Taejin Choi;
- Jaewon Kim;
- Hyungjun Kim
- 제목
- Ultra Low-k Properties of Atomic Layer Deposited Amorphous Boron Nitride for Futuristic Inter Metal Dielectric
- 저자
- 손인규; Taejin Choi; Jaewon Kim; Hyungjun Kim
- 발행일
- 2024-06-06
- 학회명
- 2024 IEEE International Interconnect Technology Conference (IITC 2024)
- 학회 개최일
- 2024-06-03 ~ 2024-06-06