Ultrahigh photoresponse in strain- and domain-engineered large-scale MoS<sub>2</sub> monolayer films
  • Jung, Ye Seul
  • Park, Jae Woo
  • 김지연
  • Park, Youngseo
  • Roe, Dong Gue
  • 외 3명
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초록

<jats:p>Ultrahigh photoresponse with the record photoresponsivity is achieved by the strain- and domain-engineering of large-scale monolayer MoS<jats:sub>2</jats:sub> films for maximum tensile strain and suitable atomic alignments.</jats:p>

제목
Ultrahigh photoresponse in strain- and domain-engineered large-scale MoS<sub>2</sub> monolayer films
저자
Jung, Ye SeulPark, Jae Woo김지연Park, YoungseoRoe, Dong GueHeo, JunseokCho, Jeong HoCho, Yong Soo
DOI
10.1039/d3ta00642e
발행일
2023-08
저널명
Journal of Materials Chemistry A
11
32
페이지
17101 ~ 17111