상세 보기
Ultra Low-k Properties of Atomic Layer Deposited Amorphous Boron Nitride for Futuristic Inter Metal Dielectric
- Sohn, Inkyu;
- Taehoon Kim;
- Hyungjun Kim
- 제목
- Ultra Low-k Properties of Atomic Layer Deposited Amorphous Boron Nitride for Futuristic Inter Metal Dielectric
- 저자
- Sohn, Inkyu; Taehoon Kim; Hyungjun Kim
- 발행일
- 2025-02-13
- 학회명
- The 32nd Korean Conference on Semiconductors (KCS 2025)
- 학회 개최일
- 2025-02-12 ~ 2025-02-15