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Ultrahigh photoresponse in strain- and domain-engineered large-scale MoS<sub>2</sub> monolayer films

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dc.contributor.authorJung, Ye Seul-
dc.contributor.authorPark, Jae Woo-
dc.contributor.author김지연-
dc.contributor.authorPark, Youngseo-
dc.contributor.authorRoe, Dong Gue-
dc.contributor.authorHeo, Junseok-
dc.contributor.authorCho, Jeong Ho-
dc.contributor.authorCho, Yong Soo-
dc.date.accessioned2025-04-10T02:44:49Z-
dc.date.available2025-04-10T02:44:49Z-
dc.date.issued2023-08-
dc.identifier.issn2050-7488-
dc.identifier.issn2050-7496-
dc.identifier.urihttps://yscholarhub.yonsei.ac.kr/handle/2021.sw.yonsei/23347-
dc.description.abstract&lt;jats:p&gt;Ultrahigh photoresponse with the record photoresponsivity is achieved by the strain- and domain-engineering of large-scale monolayer MoS&lt;jats:sub&gt;2&lt;/jats:sub&gt; films for maximum tensile strain and suitable atomic alignments.&lt;/jats:p&gt;-
dc.format.extent11-
dc.language영어-
dc.language.isoENG-
dc.publisherRoyal Society of Chemistry-
dc.titleUltrahigh photoresponse in strain- and domain-engineered large-scale MoS&lt;sub&gt;2&lt;/sub&gt; monolayer films-
dc.typeArticle-
dc.publisher.location영국-
dc.identifier.doi10.1039/d3ta00642e-
dc.identifier.wosid000969961900001-
dc.identifier.bibliographicCitationJournal of Materials Chemistry A, v.11, no.32, pp 17101 - 17111-
dc.citation.titleJournal of Materials Chemistry A-
dc.citation.volume11-
dc.citation.number32-
dc.citation.startPage17101-
dc.citation.endPage17111-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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공과대학 (공과대학 신소재공학과)
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