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Ultrahigh photoresponse in strain- and domain-engineered large-scale MoS<sub>2</sub> monolayer films
- Authors
- Jung, Ye Seul; Park, Jae Woo; 김지연; Park, Youngseo; Roe, Dong Gue; Heo, Junseok; Cho, Jeong Ho; Cho, Yong Soo
- Issue Date
- Aug-2023
- Publisher
- Royal Society of Chemistry
- Citation
- Journal of Materials Chemistry A, v.11, no.32, pp 17101 - 17111
- Pages
- 11
- Journal Title
- Journal of Materials Chemistry A
- Volume
- 11
- Number
- 32
- Start Page
- 17101
- End Page
- 17111
- ISSN
- 2050-7488
2050-7496
- Abstract
- <jats:p>Ultrahigh photoresponse with the record photoresponsivity is achieved by the strain- and domain-engineering of large-scale monolayer MoS<jats:sub>2</jats:sub> films for maximum tensile strain and suitable atomic alignments.</jats:p>
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Collections - College of Engineering > 공과대학 신소재공학부 > 공과대학 신소재공학과 > 1. Journal Articles
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