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Fabrication and Imaging of Monolayer Phosphorene with Preferred Edge Configurations via Graphene-Assisted Layer-by-Layer Thinning

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dc.contributor.authorYANGJINLEE-
dc.contributor.author이솔-
dc.contributor.authorJUN-YEONGYOON-
dc.contributor.authorJinwoo Cheon-
dc.contributor.authorJeong, HY (Jeong, Hu Young)-
dc.contributor.authorKWANPYO KIM-
dc.date.accessioned2021-12-01T02:40:20Z-
dc.date.available2021-12-01T02:40:20Z-
dc.date.issued2020-01-
dc.identifier.issn1530-6984-
dc.identifier.issn1530-6992-
dc.identifier.urihttps://yscholarhub.yonsei.ac.kr/handle/2021.sw.yonsei/5322-
dc.description.abstractPhosphorene, a monolayer of black phosphorus (BP), is an elemental two-dimensional material with interesting physical properties, such as high charge carrier mobility and exotic anisotropic in-plane properties. To fundamentally understand these various physical properties, it is critically important to conduct an atomic-scale structural investigation of phosphorene, particularly regarding various defects and preferred edge configurations. However, it has been challenging to investigate mono- and few-layer phosphorene because of technical difficulties arising in the preparation of a high-quality sample and damages induced during the characterization process. Here, we successfully fabricate high-quality monolayer phosphorene using a controlled thinning process with transmission electron microscopy and subsequently perform atomic-resolution imaging. Graphene protection suppresses the e-beam-induced damage to multilayer BP and one-side graphene protection facilitates the layer-by-layer thinning of the samples, rendering high-quality monolayer and bilayer regions. We also observe the formation of atomic-scale crystalline edges predominantly aligned along the zigzag and (101) terminations, which is originated from edge kinetics under e-beam-induced sputtering process. Our study demonstrates a new method to image and precisely manipulate the thickness and edge configurations of air-sensitive two-dimensional materials.-
dc.format.extent8-
dc.language영어-
dc.language.isoENG-
dc.publisherAMER CHEMICAL SOC-
dc.titleFabrication and Imaging of Monolayer Phosphorene with Preferred Edge Configurations via Graphene-Assisted Layer-by-Layer Thinning-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1021/acs.nanolett.9b04292-
dc.identifier.scopusid2-s2.0-85076247998-
dc.identifier.wosid000507151600072-
dc.identifier.bibliographicCitationNANO LETTERS, v.20, no.1, pp 559 - 566-
dc.citation.titleNANO LETTERS-
dc.citation.volume20-
dc.citation.number1-
dc.citation.startPage559-
dc.citation.endPage566-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordAuthorPhosphorene-
dc.subject.keywordAuthorAberration-corrected TEM imaging-
dc.subject.keywordAuthorCrystalline edge structure-
dc.subject.keywordAuthorGraphene protection-
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