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Mechanical removal of surface residues on graphene for TEM characterizations

Authors
DONGGYUKIM이솔KWANPYO KIM
Issue Date
Dec-2020
Publisher
한국현미경학회
Keywords
Atomic force microscopy; Mechanical cleaning of 2D crystals; PDMS residues; Mechanical transfer
Citation
한국현미경학회지, v.50, no.4, pp.28-1 - 28-6
Journal Title
한국현미경학회지
Volume
50
Number
4
Start Page
28-1
End Page
28-6
URI
https://yscholarhub.yonsei.ac.kr/handle/2021.sw.yonsei/5300
DOI
10.1186/s42649-020-00048-1
ISSN
2287-5123
Abstract
Contamination on two-dimensional (2D) crystal surfaces poses serious limitations on fundamental studies and applications of 2D crystals. Surface residues induce uncontrolled doping and charge carrier scattering in 2D crystals, and trapped residues in mechanically assembled 2D vertical heterostructures often hinder coupling between stacked layers. Developing a process that can reduce the surface residues on 2D crystals is important. In this study, we explored the use of atomic force microscopy (AFM) to remove surface residues from 2D crystals. Using various transmission electron microscopy (TEM) investigations, we confirmed that surface residues on graphene samples can be effectively removed via contact-mode AFM scanning. The mechanical cleaning process dramatically increases the residue-free areas, where high-resolution imaging of graphene layers can be obtained. We believe that our mechanical cleaning process can be utilized to prepare high-quality 2D crystal samples with minimum surface residues.
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